A Closer Look at Patent Licensing

01 March, 2017 Osaka/Tokyo, Japan Past Event

Location

Osaka - March 1, 2017
Umeda Hankyu Building
Office Tower 26th Floor
8-1 Kakuta-cho, Kta-ku
Osaka, Japan 530-0017

Tokyo - March 2, 2017
3-4-2 Kasumigaseki
Chiyoda-ku, Tokyo
(Seminar - Room 6G on 6th Floor; Reception - Room 7D on 7th Floor)

Contact Information

Delia Dai
ddai@foley.com

Agenda

March 1, 2017 - Osaka

March 2, 2017 - Tokyo

In the patent world, much attention is focused on the financial impact of litigations; but licensing patents can also be a good way to generate revenue.

Licensing is certainly less costly and has more certainty than generating revenue from patent litigation. However, while a patent holder earns royalty payments on a product’s future sales, licensing is no guarantee of financial riches either. If the product fails in the marketplace, the royalty checks will fail to appear as well. Also, relationships with a licensee can sour, thus costing you more legal fees and headaches.

Please join Foley and Aoyama & Partners for our seminar entitled, A Closer Look at Patent Licensing, where we will discuss the basic concepts of licensing, how to minimize some of the risks of licensing opportunities, and identifying some of the potential “problem areas” in licensing agreements.

Featured Speakers

George Beck, Partner, Foley & Lardner LLP
Etsuo Doi, Co-managing Partner, Tokyo Office, Foley & Lardner LLP
Michael Kaminski, Co-managing Partner, Tokyo Office, Foley & Lardner LLP
Stephen Maebius, Partner, Foley & Lardner LLP
Philippe Riesen, Partner, Foley & Lardner LLP

The seminar presentations will be delivered primarily in English with summary explanation in Japanese onsite, when necessary.

CLE

Foley & Lardner LLP will apply for CLE credit after the program, wherever applicable. Foley & Lardner LLP certifies that this activity has been approved for California MCLE credits by the State Bar of California in the amount of three General credit hours. Foley & Lardner LLP is a State Bar of California MCLE approved provider. Credit may not be obtained by viewing and/or listening to a program recording after the event. Certificates of attendance will be distributed to eligible participants approximately eight weeks after the program via email.

Important Information for New York Attorneys: This program is appropriate for experienced attorneys only.

Related Services

A Closer Look at Patent Licensing

Location

Osaka - March 1, 2017
Umeda Hankyu Building
Office Tower 26th Floor
8-1 Kakuta-cho, Kta-ku
Osaka, Japan 530-0017

Tokyo - March 2, 2017
3-4-2 Kasumigaseki
Chiyoda-ku, Tokyo
(Seminar - Room 6G on 6th Floor; Reception - Room 7D on 7th Floor)

Contact Information

Delia Dai
ddai@foley.com

Agenda

March 1, 2017 - Osaka

March 2, 2017 - Tokyo